Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect
نویسندگان
چکیده
منابع مشابه
Three-Dimensional Patterning using Ultraviolet Nanoimprint Lithography
Although an extensive number of publications have been reported on nanoimprint lithography (NIL) techniques, the ability of NIL for three-dimensional (3-D) patterning has not been fully addressed in terms of the mold fabrication and imprint processes. Developing technologies for patterning 3-D and multilevel features are important because they eliminate multiple steps and complex interlevel ali...
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ژورنال
عنوان ژورنال: Advanced Optical Technologies
سال: 2019
ISSN: 2192-8584,2192-8576
DOI: 10.1515/aot-2019-0005